METAL-DOPED HARD CARBON-FILMS

被引：4
|
作者：
BIEDERMAN, H
CERMAK, I
FEJFAR, A
PESICKA, J
机构：
[1] CHARLES UNIV,DEPT ELECTR & VACUUM PHYS,CS-18000 PRAGUE 8,CZECH REPUBLIC
[2] CHARLES UNIV,DEPT MET PHYS,CS-18000 PRAGUE 8,CZECH REPUBLIC
来源：
INTERNATIONAL JOURNAL OF ELECTRONICS | 1994年 / 76卷 / 05期
关键词：
D O I：
10.1080/00207219408926001
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Composite films such as metal/hard carbon have been investigated for several years. Two main deposition techniques, RF diode (metal/a-C:H) and DC magnetron (metal/C:H) sputtering have been applied. This paper considers Ag/a-C:H or C:H films prepared in unbalanced and balanced magnetron modes. The performance of the electromagnetron is briefly described. The structure of the films and changes in their optical transmission with time (aging) are discussed.
引用
收藏
页码：937 / 940
页数：4
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