FE - CO - NI THIN-FILMS

被引：10
|
作者：
HOFFMANN, H [1 ]
MIYAZAKI, T [1 ]
机构：
[1] UNIV REGENSBURG,FACHBEREICH PHYS,8400 REGENSBURG,WEST GERMANY
来源：
IEEE TRANSACTIONS ON MAGNETICS | 1974年 / MA10卷 / 03期
关键词：
D O I：
10.1109/TMAG.1974.1058439
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：556 / 559
页数：4
相关论文
共 50 条
  • [41] ANTIFERROMAGNETISM OF FCC FE THIN-FILMS
    KEUNE, W
    HALBAUER, R
    GONSER, U
    LAUER, J
    WILLIAMSON, DL
    JOURNAL OF APPLIED PHYSICS, 1977, 48 (07) : 2976 - 2979
  • [42] CEMS ANALYSIS OF FE THIN-FILMS
    PRZYBYLSKI, M
    KORECKI, J
    GRADMANN, U
    HYPERFINE INTERACTIONS, 1990, 57 (1-4): : 2053 - 2059
  • [43] ANTIFERROMAGNETISM OF FCC FE THIN-FILMS
    KEUNE, W
    HALBAUER, R
    GONSER, U
    LAUER, J
    WILLIAMSON, DL
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1977, 6 (AUG-) : 192 - 195
  • [44] Magnetism of thin films and in Fe/Ni, Co/Fe bilayers on Cu(001)
    Wilhelm, Fabrice
    Srivastava, Pankaj
    Wende, Heiko
    Ney, Andreas
    Haack, Nils
    Ceballos, Gustavo
    Farle, Michael
    Baberschke, Klaus
    Journal of Synchrotron Radiation, 1999, 6 (03): : 699 - 700
  • [45] Magnetism of thin films and in Fe/Ni, Co Fe bilayers on Cu(001)
    Wilhelm, F
    Srivastava, P
    Wende, H
    Ney, A
    Haack, N
    Ceballos, G
    Farle, M
    Baberschke, K
    JOURNAL OF SYNCHROTRON RADIATION, 1999, 6 : 699 - 700
  • [46] MAGNETIC ANISOTROPY OF THIN FILMS OF CO AND FE-CO-NI ALLOYS
    RUSOV, GI
    RUSOVA, SG
    PYNKO, VG
    PHYSICS OF METALS AND METALLOGRAPHY-USSR, 1967, 23 (05): : 177 - &
  • [47] OXIDATION BEHAVIOR OF OBLIQUELY DEPOSITED CO-NI MAGNETIC THIN-FILMS
    MAJUMDAR, D
    GAU, JS
    SPAHN, RG
    THIN SOLID FILMS, 1986, 145 (02) : 241 - 247
  • [48] MAGNETIZATION OF LAYERED MN-NI AND MN-CO THIN-FILMS
    ZIMM, CB
    STEARNS, MB
    ROACH, PR
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1985, 50 (02) : 223 - 228
  • [49] MAGNETIC-PROPERTIES OF CO-NI-MG-N THIN-FILMS
    GEORGESCU, V
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1994, 27 (01): : 17 - 21
  • [50] HIGH COERCIVITY FE-CR-CO THIN-FILMS BY VACUUM EVAPORATION
    CHIN, TS
    WANG, KH
    LIN, CH
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (08): : 1692 - 1695
12345