DEPENDENCE OF DEFECT DENSITY AND ACTIVATION-ENERGY ON DEPOSITION RATES IN COPPER-FILMS

被引：1
作者：
NARAYANDAS, K
RADHAKRISHNAN, M
BALASUBRAMANIAN, C
机构：
来源：
JOURNAL OF MATERIALS SCIENCE | 1981年 / 16卷 / 02期
关键词：
D O I：
10.1007/BF00738654
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：549 / 552
页数：4
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