ANALYSIS OF HYDROGEN CONTENT IN PLASMA SILICON-NITRIDE FILM

被引：23
|
作者：
YOSHIMI, T
SAKAI, H
TANAKA, K
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 08期
关键词：
D O I：
10.1149/1.2130015
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1853 / 1854
页数：2
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