APPLICATION OF AC TECHNIQUES TO THE STUDY OF LITHIUM DIFFUSION IN TUNGSTEN TRIOXIDE THIN-FILMS

被引：1227
|
作者：
HO, C
RAISTRICK, ID
HUGGINS, RA
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 02期
关键词：
D O I：
10.1149/1.2129668
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：343 / 350
页数：8
相关论文
共 50 条
  • [31] OBSERVATION OF NONIDEAL LITHIUM INSERTION INTO SPUTTERED THIN-FILMS OF TUNGSTEN-OXIDE
    BURDIS, MS
    SIDDLE, JR
    THIN SOLID FILMS, 1994, 237 (1-2) : 320 - 325
  • [32] STRESSES IN SPUTTERED TUNGSTEN THIN-FILMS
    HAGHIRIGOSNET, AM
    LADAN, FR
    MAYEUX, C
    LAUNOIS, H
    APPLIED SURFACE SCIENCE, 1989, 38 (1-4) : 295 - 303
  • [33] TUNGSTEN DISELENIDE THIN-FILMS SYNTHESIZED ON TUNGSTEN FOILS
    ESSAIDI, H
    BERNEDE, JC
    POUZET, J
    ZOAETER, M
    KHELIL, A
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1994, 26 (01): : 67 - 71
  • [34] TUNGSTEN PERMALLOY BILAYER THIN-FILMS AND ITS APPLICATION TO MAGNETORESISTIVE ELEMENTS
    KITADA, M
    SHIMIZU, N
    YAMAMOTO, K
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1993, 123 (1-2) : 193 - 198
  • [35] REACTIVE DIFFUSION IN THIN-FILMS
    PHILIBERT, J
    APPLIED SURFACE SCIENCE, 1991, 53 : 74 - 81
  • [36] RAMAN-STUDY OF THE FORMATION OF TUNGSTEN SILICIDE THIN-FILMS
    VUPPULADHADIUM, R
    JACKSON, HE
    BOYD, JT
    JOURNAL OF APPLIED PHYSICS, 1993, 73 (11) : 7887 - 7893
  • [37] DIFFUSION BARRIERS IN THIN-FILMS
    NICOLET, MA
    THIN SOLID FILMS, 1978, 52 (03) : 415 - 443
  • [38] RISING DIFFUSION IN THIN-FILMS
    ZHURAVLYOV, AF
    RYZHKOVA, YF
    IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII FIZIKA, 1989, 32 (07): : 91 - 93
  • [39] DIFFUSION AND REACTIONS IN THIN-FILMS
    GREER, AL
    APPLIED SURFACE SCIENCE, 1995, 86 (1-4) : 329 - 337
  • [40] Study of the potassium ion insertion of the electrodeposited electrochromic tungsten trioxide thin films
    Vijayalakshmi, R
    Jayachandran, M
    Trivedi, DC
    Sanjeeviraja, C
    IONICS, 2004, 10 (1-2) : 151 - 154
12345