CHEMICAL VAPOR-DEPOSITION OF VANADIUM-OXIDE THIN-FILMS

被引：5
|
作者：
SIEFERING, KL
GRIFFIN, GL
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 03期
关键词：
D O I：
10.1149/1.2096771
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：897 / 898
页数：2
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