ELECTRON-BEAM-INDUCED CHANGES OF THE REAL STRUCTURE OF SEMICONDUCTORS

被引：0
|
作者：
ASEEV, AL
机构：
[1] ACAD SCI GDR,INST SOLID STATE PHYS & ELECTRON MICROSCOPY,DDR-401 HALLE,GER DEM REP
[2] ACAD SCI USSR,INST SEMICOND PHYS,NOVOSIBIRSK 630090,USSR
来源：
ULTRAMICROSCOPY | 1979年 / 4卷 / 02期
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中图分类号：
TH742 [显微镜];
学科分类号：
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页码：271 / 271
页数：1
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