METASTABLE ALLOYS OF CU-CO AND CU-AG THIN FILMS DEPOSITED IN VACUUM

被引:61
作者
MADER, S
WIDMER, H
DHEURLE, FM
NOWICK, AS
机构
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D O I
10.1063/1.1753848
中图分类号
O59 [应用物理学];
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页码:201 / 203
页数:3
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