METASTABLE ALLOYS OF CU-CO AND CU-AG THIN FILMS DEPOSITED IN VACUUM

被引：61
作者：
MADER, S
WIDMER, H
DHEURLE, FM
NOWICK, AS
机构：
来源：
APPLIED PHYSICS LETTERS | 1963年 / 3卷 / 11期
关键词：
D O I：
10.1063/1.1753848
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：201 / 203
页数：3
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