ON THE ROLE OF SELF-INTERSTITIALS IN IMPURITY DIFFUSION IN SILICON

被引:28
作者
FAIR, RB
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10.1063/1.327540
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O59 [应用物理学];
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页码:5828 / 5832
页数:5
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[1]   ORIENTATION DEPENDENCE OF DIFFUSION OF BORON IN SILICON [J].
ALLEN, WG ;
ANAND, KV .
SOLID-STATE ELECTRONICS, 1971, 14 (05) :397-&
[2]   BORON IN NEAR-INTRINSIC (100) AND (111) SILICON UNDER INERT AND OXIDIZING AMBIENTS-DIFFUSION AND SEGREGATION [J].
ANTONIADIS, DA ;
GONZALEZ, AG ;
DUTTON, RW .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (05) :813-819
[3]   OXIDATION-ENHANCED DIFFUSION OF ARSENIC AND PHOSPHORUS IN NEAR-INTRINSIC [100] SILICON [J].
ANTONIADIS, DA ;
LIN, AM ;
DUTTON, RW .
APPLIED PHYSICS LETTERS, 1978, 33 (12) :1030-1033
[4]   REDISTRIBUTION OF BORON IN SILICON AFTER HIGH-TEMPERATURE PROTON IRRADIATION [J].
BARUCH, P ;
MONNIER, J ;
BLANCHARD, B ;
CASTAING, C .
APPLIED PHYSICS LETTERS, 1975, 26 (03) :77-80
[5]  
BARUCH P, 1977, RAD EFFECTS SEMICOND, P126
[6]  
BARUCH P, 1977, LATTICE DEFECTS SEMI, P126
[7]  
CHEN TC, 1970, P IEEE, V58
[8]   GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON [J].
DEAL, BE ;
GROVE, AS .
JOURNAL OF APPLIED PHYSICS, 1965, 36 (12) :3770-&
[9]   QUANTITATIVE MODEL FOR DIFFUSION OF PHOSPHORUS IN SILICON AND EMITTER DIP EFFECT [J].
FAIR, RB ;
TSAI, JCC .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (07) :1107-1118
[10]  
FAIR RB, 1977, SEMICONDUCTOR SILICO, P968