CHEMICAL VAPOR-DEPOSITION IN FLUIDIZED-BED REACTORS

被引：40
作者：
SANJURJO, A
LAU, K
WOOD, B
机构：
来源：
SURFACE & COATINGS TECHNOLOGY | 1992年 / 54卷 / 1-3期
关键词：
D O I：
10.1016/0257-8972(92)90165-7
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The intrinsic high rates of heat and mass transfer of fluidized bed reactors can be used to significantly expand applications for chemical vapor deposition. This paper illustrates some of the uses of fluidized bed reactors for depositing homogeneous coatings by chemical vapor deposition. Conventional approaches to coating particles and new developments for coating large substrates are presented. The use of subhalide chemistry for coating at low temperatures is also described.
引用
收藏
页码：219 / 223
页数：5
相关论文
共 22 条
[1]  
[Anonymous], 1991, FLUID ENG, DOI DOI 10.1016/B978-0-08-050664-7.50009-3
[2]  
ARTHUR G, 1975, 5TH P INT C CHEM VAP, P509
[3]  
Blocher J. M., 1966, U.S. Patent, Patent No. [US3,249,509, 3249509]
[4]  
BLOCHER JM, 1966, CHEM ENG PROG S SER, V62, P64
[5]  
GIRREL CA, 1985, Patent No. 4547228
[6]  
Girrell C. A., 1987, U. S. Patent, Patent No. [4671496 A, 4671496]
[7]  
GUILLERAY J, 1975, 5TH P INT C CVD, P727
[8]  
Hsu G, 1982, US Patent, Patent No. [4, 314, 525, 4314525]
[9]  
JAPKA JE, 1986, Patent No. 4623400
[10]   MICROSTRUCTURES OF ISOTROPIC PYROLYTIC CARBONS [J].
KAAE, JL .
CARBON, 1975, 13 (01) :55-62
123