PULSED ELECTRON-BEAM ANNEALING OF SPUTTERED AMORPHOUS SI-H FILMS

被引:1
作者
TARDY, J
BARBIER, D
CACHARD, A
LAUGIER, A
FONTENILLE, J
机构
[1] INST NATL SCI APPL,PHYS MAT LAB,F-69100 VILLEURBANNE,FRANCE
[2] CEN,DEPT RECH FONDAMENTALE,F-38041 GRENOBLE,FRANCE
关键词
D O I
10.1016/0025-5408(81)90052-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:347 / 352
页数:6
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