ELECTRICAL CHARACTERISTICS OF ION IMPLANTED BORON LAYERS IN SILICON

被引：8
作者：
SHANNON, JM
TREE, R
GARD, GA
机构：
来源：
CANADIAN JOURNAL OF PHYSICS | 1970年 / 48卷 / 02期
关键词：
D O I：
10.1139/p70-030
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
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页码：229 / &
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