RESIDUAL STRAINS IN HETEROEPITAXIAL III-V SEMICONDUCTOR-FILMS ON SI(100) SUBSTRATES

被引：56
作者：
SUGO, M
UCHIDA, N
YAMAMOTO, A
NISHIOKA, T
YAMAGUCHI, M
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 02期
关键词：
D O I：
10.1063/1.343113
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：591 / 595
页数：5
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