ELECTRON-BEAM LITHOGRAPHY - ITS APPLICATIONS

被引：24

作者：

HOHN, FJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584546

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1405 / 1411

页数：7

共 14 条

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[5]

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[8]

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[9] HIGH-THROUGHPUT, HIGH-RESOLUTION ELECTRON-BEAM LITHOGRAPHY [J].

PFEIFFER, HC ;

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NEWMAN, TH .

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[10] VARIABLE SPOT SHAPING FOR ELECTRON-BEAM LITHOGRAPHY [J].

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