CONTROL OF HYDROCARBON RADICALS AND FILM DEPOSITION BY USING A WHISTLER WAVE DISCHARGE IN RANGE OF RADIO-FREQUENCY

被引：10

作者：

MIENO, T ^{[1
]}

SHOJI, T ^{[1
]}

KADOTA, K ^{[1
]}

机构：

[1] NAGOYA UNIV,CTR PLASMA SCI,NAGOYA 46401,JAPAN

来源：

APPLIED PHYSICS LETTERS | 1991年 / 59卷 / 21期

关键词：

D O I：

10.1063/1.105903

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Production of hydrocarbon radicals is controlled by using a whistler wave discharge in range of radio frequency in a low pressure region (approximately 0.1 Pa). Plasma density of 10(10)-10(13) cm-3, electron temperature of 2-20 eV is obtained for the discharge of the admixture of Ar and small content of source gases (CH4, C2H2, CO). Spectroscopic measurement indicates that densities of CH and H radicals and the deposition rate of amorphous carbon:H film increase with electron density, electron temperature, and source gas pressure. The etching effect of H atoms influences on the deposition rate and a high deposition rate (90-mu-m/h for CO/Ar discharge) is obtained even in a low neutral pressure discharge.

引用

页码：2675 / 2677

页数：3

共 9 条

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