Pulsed-laser deposition of selenium

被引：9
作者：
FernandezGuasti, M [1 ]
HaroPoniatowski, E [1 ]
Diamant, R [1 ]
Ponce, L [1 ]
Jimenez, E [1 ]
机构：
[1] UNIV LA HABANA,IMRE,HAVANA,CUBA
来源：
JOURNAL OF MATERIALS SCIENCE | 1995年 / 30卷 / 24期
关键词：
D O I：
10.1007/BF00369674
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The preparation and characterization of amorphous selenium thin films grown by pulsed-laser deposition (PLD) is presented. Two laser excitation regimes at 1064 and 532 nm were studied. Interesting relations between the surface quality and the different experimental parameters were found. High-purity thin films were produced with surface quality similar to that obtained by a thermal process. A study of the emission spectra of the plasma generated during ablation is included.
引用
收藏
页码：6253 / 6256
页数：4
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