EPITAXIAL SILICON FILMS BY THE HYDROGEN REDUCTION OF SIC1

被引：178
作者：
THEUERER, HC
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1961年 / 108卷 / 07期
关键词：
D O I：
10.1149/1.2428182
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：649 / 653
页数：5
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