VORTEX FLOW CHARACTERISTICS OF HIGH-T-C, FLUX-FLOW TRANSISTORS

被引：25

作者：

MIYAHARA, K

KUBO, S

SUZUKI, M

机构：

[1] NTT Interdisciplinary Research Laboratories, Ibaraki 319-11

来源：

JOURNAL OF APPLIED PHYSICS | 1994年 / 75卷 / 01期

关键词：

D O I：

10.1063/1.355865

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

High-T-c superconducting flux flow transistors were fabricated from thin films of coevaporated YBaCuO. The vortex flow characteristics of the devices were experimentally investigated. The flow velocity of a vortex along a channel was measured from the applied magnetic field dependence of the I-V characteristics. It is 3.6-6.9X10(5) m/s when the bias current is 3-6 mA. This value is of the same order as that of a Josephson vortex flowing along a barrier region in a super-normal-super junction, and more than three orders of magnitude larger than that in type-II metal superconducting thin films.

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页码：404 / 407

页数：4

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