DIELECTRIC BREAKDOWN IN SILICON DIOXIDE FILMS ON SILICON .2. INFLUENCE OF PROCESSING AND MATERIALS

被引：93

作者：

OSBURN, CM

ORMOND, DW

机构：

来源：

关键词：

D O I：

10.1149/1.2404269

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：597 / +

页数：1

共 29 条

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