STRESS DEPENDENCE OF REACTIVELY SPUTTERED ALUMINUM NITRIDE THIN-FILMS ON SPUTTERING PARAMETERS

被引：75

作者：

HUFFMAN, GL

FAHNLINE, DE

MESSIER, R

PILIONE, LJ

机构：

[1] PENN STATE UNIV,DEPT PHYS,ALTOONA,PA 16603

[2] PENN STATE UNIV,DEPT ENGN SCI & MECH,UNIVERSITY PK,PA 16802

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.575923

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2252 / 2255

页数：4

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