STRESS DEPENDENCE OF REACTIVELY SPUTTERED ALUMINUM NITRIDE THIN-FILMS ON SPUTTERING PARAMETERS

被引：75
|
作者：
HUFFMAN, GL
FAHNLINE, DE
MESSIER, R
PILIONE, LJ
机构：
[1] PENN STATE UNIV,DEPT PHYS,ALTOONA,PA 16603
[2] PENN STATE UNIV,DEPT ENGN SCI & MECH,UNIVERSITY PK,PA 16802
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期
关键词：
D O I：
10.1116/1.575923
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：2252 / 2255
页数：4
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