共 13 条
[1]
THE DEPENDENCE OF ALUMINUM NITRIDE FILM CRYSTALLOGRAPHY ON SPUTTERING PLASMA COMPOSITION
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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,
1983, 1 (02)
:403-406
[2]
STRESS MEASUREMENT IN SPUTTERED COPPER-FILMS ON FLEXIBLE POLYIMIDE SUBSTRATES
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1987, 5 (06)
:3373-3377
[3]
REACTIVELY SPUTTERED AIN FILMS FOR GAAS ANNEALING CAPS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1986, 4 (03)
:989-992
[4]
STRESS-CONTROL IN REACTIVELY SPUTTERED AIN AND TIN FILMS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1987, 5 (04)
:1892-1897
[8]
INTERNAL-STRESSES IN CR, MO, TA, AND PT FILMS DEPOSITED BY SPUTTERING FROM A PLANAR MAGNETRON SOURCE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1982, 20 (03)
:355-358
[9]
ALN THIN-FILMS WITH CONTROLLED CRYSTALLOGRAPHIC ORIENTATIONS AND THEIR MICROSTRUCTURE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1987, 5 (04)
:1630-1634
[10]
SOMEKH RE, 1984, J VAC SCI TECHNOL A, V2, P1285, DOI 10.1116/1.572396