EVIDENCE FOR QUANTUM CONFINEMENT IN THE PHOTOLUMINESCENCE OF POROUS SI AND SIGE

被引:142
作者
GARDELIS, S [1 ]
RIMMER, JS [1 ]
DAWSON, P [1 ]
HAMILTON, B [1 ]
KUBIAK, RA [1 ]
WHALL, TE [1 ]
PARKER, EHC [1 ]
机构
[1] UNIV WARWICK,DEPT PHYS,COVENTRY CV4 7AL,W MIDLANDS,ENGLAND
关键词
D O I
10.1063/1.106098
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have used anodization techniques to process porous surface regions in p-type Czochralski Si and in p-type Si0.85Ge0.15 epitaxial layers grown by molecular beam epitaxy. The SiGe layers were unrelaxed before processing. We have observed strong near-infrared and visible light emission from both systems. Analysis of the radiative and nonradiative recombination processes indicate that the emission is consistent with the decay of excitons localized in structures of one or zero dimensions.
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页码:2118 / 2120
页数:3
相关论文
共 9 条
[1]   AN EXPERIMENTAL AND THEORETICAL-STUDY OF THE FORMATION AND MICROSTRUCTURE OF POROUS SILICON [J].
BEALE, MIJ ;
BENJAMIN, JD ;
UREN, MJ ;
CHEW, NG ;
CULLIS, AG .
JOURNAL OF CRYSTAL GROWTH, 1985, 73 (03) :622-636
[2]   SILICON QUANTUM WIRE ARRAY FABRICATION BY ELECTROCHEMICAL AND CHEMICAL DISSOLUTION OF WAFERS [J].
CANHAM, LT .
APPLIED PHYSICS LETTERS, 1990, 57 (10) :1046-1048
[3]   FERMI-DIRAC DISTRIBUTION OF EXCITONS IN COUPLED QUANTUM-WELLS [J].
KASH, JA ;
ZACHAU, M ;
MENDEZ, EE ;
HONG, JM ;
FUKUZAWA, T .
PHYSICAL REVIEW LETTERS, 1991, 66 (17) :2247-2250
[4]  
LEHMAN V, 1991, APPL PHYS LETT, V58, P865
[5]   OSCILLATOR STRENGTH OF EXCITONS IN QUANTUM-WELLS [J].
MATSUURA, M ;
KAMIZATO, T .
SURFACE SCIENCE, 1986, 174 (1-3) :183-187
[6]   FREE-CARRIER SCREENING OF THE INTERACTION BETWEEN EXCITONS AND LONGITUDINAL-OPTICAL PHONONS IN INXGA1-XAS-INP QUANTUM-WELLS [J].
SKOLNICK, MS ;
NASH, KJ ;
TAPSTER, PR ;
MOWBRAY, DJ ;
BASS, SJ ;
PITT, AD .
PHYSICAL REVIEW B, 1987, 35 (11) :5925-5928
[7]  
STREET RA, 1984, SEMICONDUCT SEMIMET, V21, P197
[8]   STRUCTURE OF POROUS SILICON LAYER AND HEAT-TREATMENT EFFECT [J].
UNAGAMI, T ;
SEKI, M .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (08) :1339-1344
[9]   FORMATION AND PROPERTIES OF POROUS SILICON AND ITS APPLICATION [J].
WATANABE, Y ;
ARITA, Y ;
YOKOYAMA, T ;
IGARASHI, Y .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (10) :1351-1355