DIRECT WRITING THROUGH RESIST EXPOSURE USING A FOCUSED ION-BEAM SYSTEM

被引：9

作者：

OCHIAI, Y

KOJIMA, Y

MATSUI, S

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 04期

关键词：

D O I：

10.1116/1.584297

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1055 / 1061

页数：7

共 23 条

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