SF6 DECOMPOSITION IN GAS-INSULATED EQUIPMENT

[1] AGOSTINO R, 1981, J APPL PHYS, V52, P162

[2] THE FORMATION OF NEGATIVE IONS OF SULFUR HEXAFLUORIDE [J]. JOURNAL OF CHEMICAL PHYSICS, 1953, 21 (01) : 119 - 124

[3] AIREY DR, 1979, J PHYS D, V12

[4] AMALRIC J, 1974, REV GENERALE ELE JUN, P45

[5] AOKI N, 1978, E278004 CENTR RES I

[6] SULPHUR HEXAFLUORIDE - ITS PROPERTIES AND USE AS A GASEOUS INSULATOR IN VAN DE GRAAFF ACCELERATORS [J]. IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1965, NS12 (03) : 266 - &

[7] ION-MOLECULE REACTIONS OF SF6 - DETERMINATION OF IP(SF5), AP(SF5+-SF6), AND D(SF5-F) [J]. JOURNAL OF CHEMICAL PHYSICS, 1981, 74 (10) : 5700 - 5706

[8] BAKER A, 1980, EPRI EL1646 REP

[9] BARGIGIA A, 1983, 4TH P INT S HIGH VOL

[10] Bartakova B., 1978, Elektrotechnicky Obzor, V67, P230

[1] AGOSTINO R, 1981, J APPL PHYS, V52, P162

[2] THE FORMATION OF NEGATIVE IONS OF SULFUR HEXAFLUORIDE [J]. JOURNAL OF CHEMICAL PHYSICS, 1953, 21 (01) : 119 - 124

[3] AIREY DR, 1979, J PHYS D, V12

[4] AMALRIC J, 1974, REV GENERALE ELE JUN, P45

[5] AOKI N, 1978, E278004 CENTR RES I

[6] SULPHUR HEXAFLUORIDE - ITS PROPERTIES AND USE AS A GASEOUS INSULATOR IN VAN DE GRAAFF ACCELERATORS [J]. IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1965, NS12 (03) : 266 - &

[7] ION-MOLECULE REACTIONS OF SF6 - DETERMINATION OF IP(SF5), AP(SF5+-SF6), AND D(SF5-F) [J]. JOURNAL OF CHEMICAL PHYSICS, 1981, 74 (10) : 5700 - 5706

[8] BAKER A, 1980, EPRI EL1646 REP

[9] BARGIGIA A, 1983, 4TH P INT S HIGH VOL

[10] Bartakova B., 1978, Elektrotechnicky Obzor, V67, P230