SPUTTER TYPE HF ION-SOURCE FOR ION-BEAM DEPOSITION APPARATUS

被引：18
|
作者：
YAMASHITA, M
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1987年 / 26卷 / 05期
关键词：
D O I：
10.1143/JJAP.26.721
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：721 / 727
页数：7
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