STUDY OF CHEMICAL-BONDS IN A-B/C H-FILMS BY ELECTRON-PROBE MICROANALYSIS

This paper describes the study of chemical bonds in amorphous hydrogen rich boron/carbon (a-B/C:H) films by electron probe microanalysis. The films were deposited on Si single crystals by plasma chemical vapour deposition with a precursor-carborane (C2B10H12) in a laboratory setup. A film thickness and B/C ratio up to a value of 8000 angstrom and 4, respectively, have been obtained. The analysis of boron and carbon X-ray emission spectra has shown that the nearest order in the films is characterized by the coexistence of C-C, B-C and B-B bonds for B/C congruent-to 1 and of B-B and B-C bonds for B/C congruent-to 4. After two years exposure in air the oxygen content in the films increases from 2-5 to 15-20 at.%.