LASER PROCESSING OF ION-IMPLANTED SEMICONDUCTOR MATERIAL FOR DEVICE APPLICATIONS

被引：0
|
作者：
WILSON, SR [1 ]
机构：
[1] MOTOROLA INC,SEMICOND RES & DEV LAB,PHOENIX,AZ 85008
来源：
BULLETIN OF THE AMERICAN PHYSICAL SOCIETY | 1980年 / 25卷 / 07期
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D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
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页码：774 / 775
页数：2
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