LASER PROCESSING OF ION-IMPLANTED SEMICONDUCTOR MATERIAL FOR DEVICE APPLICATIONS

被引:0
|
作者
WILSON, SR [1 ]
机构
[1] MOTOROLA INC,SEMICOND RES & DEV LAB,PHOENIX,AZ 85008
来源
关键词
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:774 / 775
页数:2
相关论文
共 50 条
  • [1] LASER PROCESSING OF ION-IMPLANTED SEMICONDUCTOR-MATERIALS FOR DEVICE APPLICATIONS
    WILSON, S
    VARKER, C
    PAULSON, W
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1981, 28 (02) : 1754 - 1758
  • [2] LASER PROCESSING OF ION-IMPLANTED SILICON
    APPLETON, BR
    WHITE, CW
    LARSON, BC
    WILSON, SR
    NARAYAN, J
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1979, 26 (01) : 1686 - 1692
  • [3] LASER PROCESSING OF ION-IMPLANTED SILICON
    APPLETON, BR
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1978, 23 (08): : 1032 - 1032
  • [4] A study of ion-implanted semiconductor nanostructures
    Boero, M
    Inkson, JC
    Faini, G
    Vieu, C
    Laruelle, F
    Bedel, E
    Fontaine, C
    SURFACE SCIENCE, 1997, 377 (1-3) : 103 - 107
  • [5] APPLICATIONS OF CW BEAM PROCESSING TO ION-IMPLANTED CRYSTALLINE SILICON
    LIETOILA, A
    GIBBONS, JF
    SEMICONDUCTORS AND SEMIMETALS, 1984, 17 : 107 - 175
  • [6] ION-IMPLANTED SEMICONDUCTOR-DEVICES
    LEE, DH
    MAYER, JW
    PROCEEDINGS OF THE IEEE, 1974, 62 (09) : 1241 - 1255
  • [7] DEVICE MODEL FOR AN ION-IMPLANTED MESFET
    TAYLOR, GW
    DARLEY, HM
    FRYE, RC
    CHATTERJEE, PK
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (03) : 172 - 182
  • [8] LASER APPLICATIONS TO SEMICONDUCTOR-DEVICE PROCESSING
    SHAH, RR
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1983, 385 : 16 - 23
  • [9] SEMICONDUCTOR-DEVICE APPLICATIONS OF LASER PROCESSING
    CROSTHWAIT, DL
    IEEE JOURNAL OF QUANTUM ELECTRONICS, 1981, 17 (12) : 136 - &
  • [10] SUPPRESSION OF ANOMALOUS DIFFUSION OF ION-IMPLANTED BORON IN SILICON BY LASER PROCESSING
    JUANG, MH
    WAN, FS
    LIU, HW
    CHENG, KL
    CHENG, HC
    JOURNAL OF APPLIED PHYSICS, 1992, 71 (07) : 3628 - 3630