LASER ANNEALING OF NB FILMS PREPARED BY ION-BEAM SPUTTERING

被引：1

作者：

TAKEI, K

NAGAI, K

INAMURA, T

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷 / 07期

关键词：

D O I：

10.1143/JJAP.19.L392

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：L392 / L394

页数：3

相关论文

共 3 条

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