LOW-TEMPERATURE RESISTIVITY OF SILVER

被引：36

作者：

KHOSHNEVISAN, M ^{[1
]}

PRATT, WP ^{[1
]}

SCHROEDER, PA ^{[1
]}

STEENWYK, S ^{[1
]}

UHER, C ^{[1
]}

机构：

[1] MICHIGAN STATE UNIV,E LANSING,MI 48824

来源：

JOURNAL OF PHYSICS F-METAL PHYSICS | 1979年 / 9卷 / 01期

关键词：

D O I：

10.1088/0305-4608/9/1/001

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The resistivity rho has been measured between 0.04 and 7K for 'pure' polycrystalline ingots of silver, in a dilution refrigerator with a SQUID null detector system. The measurements confirm the existence of a substantial temperature range where rho - rho 0 varies as T4. At the lowest temperatures rho - rho 0 varies as T2.19, which strongly suggests that an electron-electron scattering T2 regime may be reached using a higher-precision measuring technique.

引用

页码：L1 / L5

页数：5

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