INCREASE IN PHOTOSENSITIVITY IN SILICA-BASED OPTICAL WAVE-GUIDES ON SILICON

被引：5
|
作者：
HIBINO, Y [1 ]
ABE, M [1 ]
YAMADA, H [1 ]
OHMORI, Y [1 ]
BILODEAU, F [1 ]
MALO, B [1 ]
HILL, KO [1 ]
机构：
[1] COMMUN RES CTR,OTTAWA K2H 8S2,ONTARIO,CANADA
来源：
ELECTRONICS LETTERS | 1993年 / 29卷 / 07期
关键词：
OPTICAL WAVE-GUIDES; PHOTOREFRACTIVE MATERIALS; INTEGRATED OPTICS;
D O I：
10.1049/el:19930416
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
An increase in the photoinduced refractive-index change DELTAn in silica-based optical waveguides on silicon is described. The increase is attained by the consolidation of a core film in a reducing atmosphere. A maximum DELTAn of 3-9 x 10(-4) is obtained for the TE mode by UV laser irradiation at 248 nm. This is four times larger than that in conventional waveguides.
引用
收藏
页码：621 / 623
页数：3
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