SINGLE PHOTOMASK, MULTILEVEL KINOFORMS IN QUARTZ AND PHOTORESIST - MANUFACTURE AND EVALUATION

被引：31
作者：
ANDERSSON, H
EKBERG, M
HARD, S
JACOBSSON, S
LARSSON, M
NILSSON, T
机构：
[1] Chalmers University of Technology, Department of Applied Electron Physics, Gothenburg
来源：
APPLIED OPTICS | 1990年 / 29卷 / 28期
关键词：
Computer-generated holograms; Manufacture; Multilevel kinoforms; Partial illumination; Photoresist; Quartz;
D O I：
10.1364/AO.29.004259
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Kinoforms manufactured in photoresist by photolithographic techniques using a single, ten-level, grey scale photomask, exposed in a specially designed laser exposure system, are described. Kinoforms designed for uniform as well as for partial Gaussian beam illumination are discussed. The highest measured diffraction efficiency was 55%. Photoresist kinoforms were transferred into quartz substrates by reactive ion etching. The highest measured diffraction efficiency for the resulting all-quartz kinoforms was 53%. © 1990 Optical Society of America.
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页码：4259 / 4267
页数：9
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