INFLUENCE OF PHOSPHORUS-INDUCED POINT-DEFECTS ON A GOLD-GETTERING MECHANISM IN SILICON

被引:29
作者
LECROSNIER, D [1 ]
PAUGAM, J [1 ]
RICHOU, F [1 ]
PELOUS, G [1 ]
机构
[1] INST UNIV TECHNOL LANNION,PHYS MAT LAB,F-22302 LANNION,FRANCE
关键词
D O I
10.1063/1.327732
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:1036 / 1038
页数:3
相关论文
共 13 条
[1]   ELECTRICALLY ACTIVE STACKING-FAULTS IN CMOS INTEGRATED-CIRCUITS [J].
DISHMAN, JM ;
HASZKO, SE ;
MARCUS, RB ;
MURARKA, SP ;
SHENG, TT .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (04) :2689-2696
[2]   QUANTITATIVE MODEL FOR DIFFUSION OF PHOSPHORUS IN SILICON AND EMITTER DIP EFFECT [J].
FAIR, RB ;
TSAI, JCC .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (07) :1107-1118
[4]   DIFFUSION OF GOLD IN THIN SILICON SLICES [J].
HUNTLEY, FA ;
WILLOUGHBY, AF .
SOLID-STATE ELECTRONICS, 1970, 13 (09) :1231-+
[5]   LONG-RANGE ENHANCEMENT OF BORON DIFFUSIVITY INDUCED BY A HIGH-SURFACE-CONCENTRATION PHOSPHORUS DIFFUSION [J].
LECROSNIER, D ;
GAUNEAU, M ;
PAUGAM, J ;
PELOUS, G ;
RICHOU, F .
APPLIED PHYSICS LETTERS, 1979, 34 (03) :224-226
[6]  
LECROSNIER D, 1978, I PHYS C SER, V46, P566
[7]  
LECROSNIER D, UNPUBLISHED
[8]   NEW OBSERVATION OF ENHANCED DIFFUSION [J].
LEE, DB ;
WILLOUGHBY, AF .
JOURNAL OF APPLIED PHYSICS, 1972, 43 (01) :245-+
[9]  
PETROFF PM, 1977, SEMICONDUCTOR SILICO, V77
[10]   ELIMINATION OF OXIDATION-INDUCED STACKING-FAULTS BY PREOXIDATION GETTERING OF SILICON WAFERS .1. PHOSPHORUS DIFFUSION-INDUCED MISFIT DISLOCATIONS [J].
ROZGONYI, GA ;
PETROFF, PM ;
READ, MH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (12) :1725-1729