KINETIC FACTORS IN CHEMICAL VAPOR-DEPOSITION OF CARBON FROM METHANE

被引：0
|
作者：
LIEBERMA.ML [1 ]
NOLES, GT [1 ]
机构：
[1] SANDIA LABS, ALBUQUERQUE, NM USA
来源：
CARBON | 1973年 / 11卷 / 06期
关键词：
D O I：
10.1016/0008-6223(73)90361-8
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：672 / 672
页数：1
相关论文
共 50 条
  • [31] DIAMOND CHEMICAL VAPOR-DEPOSITION
    CELII, FG
    BUTLER, JE
    ANNUAL REVIEW OF PHYSICAL CHEMISTRY, 1991, 42 (01) : 643 - 684
  • [32] LASERS IN CHEMICAL VAPOR-DEPOSITION
    不详
    MICROELECTRONICS AND RELIABILITY, 1973, 12 (02): : 177 - &
  • [33] HOMOGENEOUS CHEMICAL VAPOR-DEPOSITION
    SCOTT, BA
    OLBRICHT, WL
    MEYERSON, BA
    REIMER, JA
    WOLFORD, DJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02): : 450 - 456
  • [34] CHEMICAL VAPOR-DEPOSITION OF DIAMOND
    SPEAR, KE
    FRENKLACH, M
    BADZIAN, A
    BADZIAN, T
    HARTNETT, T
    MESSIER, R
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C483 - C483
  • [35] CHEMICAL VAPOR-DEPOSITION - FOREWORD
    HITCHMAN, ML
    JOURNAL DE PHYSIQUE III, 1992, 2 (08): : U1373 - U1373
  • [36] CHEMICAL VAPOR-DEPOSITION OF DIAMOND
    SATO, Y
    DENKI KAGAKU, 1989, 57 (05): : 360 - 364
  • [37] FAILURE BEHAVIOR OF CARBON CARBON COMPOSITES PREPARED BY CHEMICAL VAPOR-DEPOSITION
    SOHN, KY
    OH, SM
    LEE, JY
    CARBON, 1988, 26 (02) : 157 - 162
  • [38] CHEMICAL VAPOR-DEPOSITION OF CHROMIUM
    HANNI, W
    HINTERMANN, HE
    THIN SOLID FILMS, 1977, 40 (JAN) : 107 - 114
  • [39] CHEMICAL VAPOR-DEPOSITION OF DIAMOND
    ANGUS, JC
    ARGOITIA, A
    GAT, R
    LI, Z
    SUNKARA, M
    WANG, L
    WANG, Y
    PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES, 1993, 342 (1664): : 195 - 208
  • [40] CHEMICAL VAPOR-DEPOSITION OF RUTHENIUM
    GROSS, ME
    PAPA, LE
    GREEN, ML
    SCHNOES, KJ
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (03) : C88 - C88
12345