OBSERVATIONS OF FINAL-STATE SCREENING IN INVERSE PHOTOEMISSION FROM ADSORBED XENON LAYERS

被引：51

作者：

HORN, K ^{[1
]}

FRANK, KH ^{[1
]}

WILDER, JA ^{[1
]}

REIHL, B ^{[1
]}

机构：

[1] IBM CORP,ZURICH RES LAB,CH-8803 RUSCHLIKON,SWITZERLAND

来源：

PHYSICAL REVIEW LETTERS | 1986年 / 57卷 / 08期

关键词：

D O I：

10.1103/PhysRevLett.57.1064

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

收藏

页码：1064 / 1067

页数：4

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