GUIDED-WAVE OPTICAL THIN-FILM LUNEBURG LENSES - FABRICATION TECHNIQUE AND PROPERTIES

被引：23

作者：

YAO, SK

ANDERSON, DB

AUGUST, RR

YOUMANS, BR

OANIA, CM

机构：

[1] Rockwell International, Electronics Research Center, Anaheim, CA

来源：

APPLIED OPTICS | 1979年 / 18卷 / 24期

关键词：

D O I：

10.1364/AO.18.004067

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

With computer-aided design and a digital-controlled lathe, shadow sputtering masks have been made with precisely tailored contour for the fabrication of guided-wave optical thin-film Luneburg lenses. Nearly diffraction-limited performance has been obtained reproducibly for a family of thin-film circular lenses ranging between F/4 and F/30 derived from generalized thin-film Luneburg lens profiles when only the center portion of the lens aperture is employed, in good agreement with numerical ray-tracing results. Both the design and construction of the mask and the analytical as well as experimental results of the thin-film generalized Luneburg lenses are reported. In addition, the fabrication tolerance for this guided-wave optical lens system is described. © 1979 Optical Society of America.

引用

页码：4067 / 4079

页数：13

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