GUIDED-WAVE OPTICAL THIN-FILM LUNEBURG LENSES - FABRICATION TECHNIQUE AND PROPERTIES

被引：23
作者：
YAO, SK
ANDERSON, DB
AUGUST, RR
YOUMANS, BR
OANIA, CM
机构：
[1] Rockwell International, Electronics Research Center, Anaheim, CA
来源：
APPLIED OPTICS | 1979年 / 18卷 / 24期
关键词：
D O I：
10.1364/AO.18.004067
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
With computer-aided design and a digital-controlled lathe, shadow sputtering masks have been made with precisely tailored contour for the fabrication of guided-wave optical thin-film Luneburg lenses. Nearly diffraction-limited performance has been obtained reproducibly for a family of thin-film circular lenses ranging between F/4 and F/30 derived from generalized thin-film Luneburg lens profiles when only the center portion of the lens aperture is employed, in good agreement with numerical ray-tracing results. Both the design and construction of the mask and the analytical as well as experimental results of the thin-film generalized Luneburg lenses are reported. In addition, the fabrication tolerance for this guided-wave optical lens system is described. © 1979 Optical Society of America.
引用
收藏
页码：4067 / 4079
页数：13
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