In-line Process Control in the Active Screen Plasma Nitrocarburizing Using a Combined Approach Based on Infrared Laser Absorption Spectroscopy and Bias Power Management

被引：11

作者：

Burlacov, I. ^{[1
]}

Hamann, S. ^{[2
]}

Spies, H. -J. ^{[1
]}

Roepcke, J. ^{[2
]}

Biermann, H. ^{[1
]}

机构：

[1] TU Bergakad Freiberg, Inst Engn Mat, Gustav Zeuner Str 5, D-09599 Freiberg, Germany

[2] INP Greifswald, Greifswald, Germany

来源：

HTM-JOURNAL OF HEAT TREATMENT AND MATERIALS | 2016年 / 71卷 / 04期

关键词：

Active screen plasma nitrocarburizing; afterglow; epsilon-carbonitride layer; bias activation; process control; mid infrared QCLAS;

D O I：

10.3139/105.110292

中图分类号：

O414.1 [热力学];

学科分类号：

摘要：

The active screen plasma nitrocarburizing (ASPNC) technology is an extension of the ASPN method in that carbon-bearing gases such as CH4 are admixed to the N-2-H-2 process gas. Besides process gas composition and working pressure, a bias power applied to the component surface is an important parameter in the nitrocarburizing process governing the competing uptake between nitrogen and carbon on the metallic surface. A variation of the bias power during the treatment provides the possibility of the dynamic control of both the n-itriding and the carburizing potential without change of process gas composition. A two-stage process was implemented to improve the quality of the compound layer. The application of advanced in-situ and non-intrusive spectroscopic method of laser absorption spectroscopy in the mid infrared spectral range provides the valuable information about the plasma chemical reactions in the afterglow plasma, supplying the absolute concentrations of stable and transient molecular species monitored direct in process. The amount of hydrogen cyanide (HCN) measured in-situ by QCLAS diagnostics was found to be a reliable parameter to control the carburizing potential of the nitrocarburizing atmosphere.

引用

页码：141 / 147

页数：7

共 14 条

[1]

Burlacov I., 2014, J INT HEAT TREAT SUR, V8, P139, DOI [10.1179/1749514814z.000000000108, DOI 10.1179/1749514814Z.000000000108]

[2]

Delmas B., 2001, [No title captured], Patent No. [WO2001079579A1, 2001079579]

[3]

Delmas B., 2005, European patent, Patent No. [EP1274873B1, 1274873]

[4]

Denzer A., 1993, German patent, Patent No. [DE4211395, 4211395]

[5]

Georges J, 2001, HEAT TREAT MET, V28, P33

[6]

Georges J., 1999, US Patent, Patent No. [5989363A, 5989363]

[7]

Georges J, 2000, P 12 IFHTSE C MELB A, V3, P229

[8] Spectroscopic Investigations of Plasma Nitriding and Nitrocarburizing Processes Using an Active Screen: A Comparative Plasma Chemical Study of Two Reactor Types [J].

Hamann, S. ;

Boerner, K. ;

Burlacov, I. ;

Spies, H. -J. ;

Roepcke, J. .

CONTRIBUTIONS TO PLASMA PHYSICS, 2015, 55 (10) :689-700

[9] Spectroscopic studies of conventional and active screen N2-H2 plasma nitriding processes with admixtures of CH4 or CO2 [J].

Hamann, S. ;

Boerner, K. ;

Burlacov, I. ;

Huebner, M. ;

Spies, H-J ;

Roepcke, J. .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 2013, 22 (05)

[10]

Haruman E., 1992, Surface Engineering, V8, P275

← 1 2 →