3-MASK SELF-ALIGNED MOS TECHNOLOGY

被引：0

作者：

MAI, CC ^{[1
]}

CHAN, TC ^{[1
]}

PALMER, RB ^{[1
]}

机构：

[1] MOSTEK CORP,WORCESTER,MA 01606

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1973年 / ED20卷 / 12期

关键词：

D O I：

10.1109/T-ED.1973.17813

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1162 / 1164

页数：3

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