CONTROL OF PINHOLES IN EPITAXIAL COSI2 LAYERS ON SI(111)

被引:63
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TUNG, RT
BATSTONE, JL
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10.1063/1.99393
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O59 [应用物理学];
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页码:648 / 650
页数:3
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共 27 条
[1]  
BATSTONE JL, 1987, MATER RES SOC S P, V91, P445
[2]   SILICON METAL SILICIDE HETEROSTRUCTURES GROWN BY MOLECULAR-BEAM EPITAXY [J].
BEAN, JC ;
POATE, JM .
APPLIED PHYSICS LETTERS, 1980, 37 (07) :643-646
[3]   HIGH-TEMPERATURE NUCLEATION AND SILICIDE FORMATION AT THE CO/SI(111)-7X7 INTERFACE - A STRUCTURAL INVESTIGATION [J].
CHAMBERS, SA ;
ANDERSON, SB ;
CHEN, HW ;
WEAVER, JH .
PHYSICAL REVIEW B, 1986, 34 (02) :913-920
[4]   ATOMIC-STRUCTURE OF THE NISI2/(111)SI INTERFACE [J].
CHERNS, D ;
ANSTIS, GR ;
HUTCHISON, JL ;
SPENCE, JCH .
PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES, 1982, 46 (05) :849-862
[5]   STRUCTURAL-ANALYSIS OF AN SI/COSI2/SI HETEROSTRUCTURE USING ULTRAHIGH RESOLUTION TRANSMISSION ELECTRON-MICROSCOPY [J].
DANTERROCHES, C ;
DAVITAYA, FA .
THIN SOLID FILMS, 1986, 137 (02) :351-361
[6]   INSITU STUDY OF THE MOLECULAR-BEAM EPITAXY OF COSI2 ON (111) SI BY TRANSMISSION ELECTRON-MICROSCOPY AND DIFFRACTION [J].
GIBSON, JM ;
BATSTONE, JL ;
TUNG, RT .
APPLIED PHYSICS LETTERS, 1987, 51 (01) :45-47
[7]  
HELLMAN F, IN PRESS PHYS REV B
[8]   ELECTRICAL TRANSPORT-PROPERTIES OF COSI2 AND NISI2 THIN-FILMS [J].
HENSEL, JC ;
TUNG, RT ;
POATE, JM ;
UNTERWALD, FC .
APPLIED PHYSICS LETTERS, 1984, 44 (09) :913-915
[9]  
HUNT BD, 1986, MATER RES SOC S P, V56, P151
[10]  
HUNT BD, 1987, UNPUB MAT RES SOC SP