DEVELOPMENT OF THERMALLY STABLE NI-AG INTERCONNECTIONS FOR APPLICATION TO RESISTIVE FILMS

被引:6
|
作者
KHANNA, PK
BHATNAGAR, SK
DALKE, G
BRUNNER, D
GUST, W
机构
[1] CENT ELECT ENGN RES INST,PILANI 333031,RAJASTHAN,INDIA
[2] INST MET,D-70174 STUTTGART,GERMANY
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1995年 / 33卷 / 2-3期
关键词
INTERFACIAL STRESS; SILVER; NICKEL; THERMAL PROPERTIES;
D O I
10.1016/0921-5107(94)01204-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Ni plates coated with a thin film of Sn are interconnected with thick-film Ag conductors at different processing conditions using the isothermal solidification technique. The joints thus produced consist of intermetallic phases and are stable at higher temperatures than their fabrication temperature. Light microscopy and scanning electron microscopy together with wavelength dispersive X-ray analysis of the cross-section of the samples is performed to examine the phase formation at the interfacial regions. Based on these, optimum fabrication parameters for producing mechanically strong joints are obtained.
引用
收藏
页码:L6 / L9
页数:4
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