HEXAGONAL WSI2 IN CO-SPUTTERED (TUNGSTEN AND SILICON) MIXTURE

被引：53

作者：

MURARKA, SP

READ, MH

CHANG, CC

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1981年 / 52卷 / 12期

关键词：

D O I：

10.1063/1.328741

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：7450 / 7452

页数：3

共 15 条

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