INFLUENCE OF THE SURFACE-ROUGHNESS ON CRITICAL CURRENT-DENSITY OF THE BI-PB-SR-CA-CU-O SUPERCONDUCTIVE THIN-FILMS

被引:0
|
作者
TSUKAMOTO, K
SHIMOJIMA, H
ISHII, M
YAMAGISHI, C
机构
来源
NIPPON SERAMIKKUSU KYOKAI GAKUJUTSU RONBUNSHI-JOURNAL OF THE CERAMIC SOCIETY OF JAPAN | 1991年 / 99卷 / 01期
关键词
BI-PB-SR-CA-CU-O THIN FILM; RF MAGNETRON SPUTTERING; MULTI TARGET; SURFACE ROUGHNESS; CRITICAL CURRENT DENSITY;
D O I
暂无
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Bi-Pb-Sr-Ca-Cu-O superconductive films (T(c) greater-than-or-equal-to 100 K) were obtained by annealing films A (Bi + Pb) 1.47SR1.00 Ca0.92Cu1.80O(x) at 850-degrees-C which were prepared by rf-magnetron sputtering using multi-targets. The critical current density (J(c)) of the annealed films was greatly influenced by the surface roughness of the film. J(c) increased proportionally with a decrease in surface roughness, indicating that the decrease of J(c) was caused by the rough surface of the film, and by a liquid phase formed during the annealing process. To avoid the formation of the liquid phase and to obtain smooth surface films, low Ca content films B ( (Bi + Pb) 1.27SR1.00 Ca0.76Cu1.37Ox) were prepared and annealed at a low temperature (835-degrees-C). The surface of the annealed film B was smoother than that of the annealed film A. The obtained films with smooth surface films showed high J(c) (= 27,000 A/cm2) at 77 K in zero magnetic field.
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页码:68 / 72
页数:5
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