EFFECTS OF OXYGEN ON PROPERTIES OF RF SPUTTERED NIFE FILMS

被引：21

作者：

HAMMER, WN ^{[1
]}

AHN, KY ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 04期

关键词：

Compendex;

D O I：

10.1116/1.570564

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

NICKEL IRON ALLOYS

引用

页码：804 / 807

页数：4

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