AUGER AND X-RAY PHOTOELECTRON-SPECTROSCOPY STUDIES OF PREFERENTIAL SPUTTERING IN Y2O3-DOPED ZRO2 FILMS

被引:28
作者
GREENE, JE
KLINGER, RE
BARR, TL
WELSH, LB
机构
[1] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801
[2] UOP INC,DES PLAINES,IL 60016
关键词
D O I
10.1016/0009-2614(79)80410-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Auger and X-ray photoelectron spectroscopies have been used to investigate preferential sputtering effects in stabilized cubic 8 mole ??? Y2O3-doped ZrO2 films. The results show that oxygen is preferentially removed by Ar+ ion bombardment while the relative Y to Zr concentrations remain essentially constant. At 900 eV, the ratio of the oxygen to zirconium sputtering yields was found to be ≈90% of the value observed at 2000 eV. The XPS spectra showed a decrease in the binding energy of the metal 3d peaks with an associated peak broadening toward lower energies. © 1979.
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页码:46 / 50
页数:5
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