LOW-TEMPERATURE CHEMICAL PRECIPITATION AND VAPOR-DEPOSITION OF SNXS THIN-FILMS

被引:118
作者
ENGELKEN, RD
MCCLOUD, HE
LEE, C
SLAYTON, M
GHOREISHI, H
机构
[1] Arkansas State Univ, Jonesboro, AR,, USA, Arkansas State Univ, Jonesboro, AR, USA
关键词
ACIDS - Organic - ELECTROLESS PLATING - FILMS - Metallic - TIN AND ALLOYS - Chemical Vapor Deposition - TIN COMPOUNDS;
D O I
10.1149/1.2100274
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Films of gray-black Sn//1// minus //xS (E//g approximately equals 1. 0-1. 3 eV), brown Sn//2// plus or minus //xS//3 (E//g approximately equals 1. 6-1. 9 eV), and/or SnS//2// minus //x (E//g approximately equals 2. 1-2. 3 eV) were deposited onto nonconductive substrates by (i) an 'electroless,' chemical precipitation mechanism in organic acid/H//2O baths of SnCl//2, S, and Sn(II)-complexing agents and/or (ii) a novel, above-solution CVD mechanism involving condensation and reaction of Sn and S species such as SnCl//4 and H//2S. H//2O and complexing agent (potassium gluconate or tartaric acid) concentrations critically affect film stoichiometry due to their 'freeing' (with acid ionization) or chelating of the Sn(II). A surface area-minimizing Sn(II,IV)-S(-II) exchange reaction is postulated to explain slow transfer of Sn//xS deposit/precipitate to smooth surfaces.
引用
收藏
页码:2696 / 2707
页数:12
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