INTERNAL-STRESSES IN AMORPHOUS-SILICON FILMS DEPOSITED BY CYLINDRICAL MAGNETRON SPUTTERING USING NE, AR, KR, XE, AND AR+H2

被引：76

作者：

THORNTON, JA ^{[1
]}

HOFFMAN, DW ^{[1
]}

机构：

[1] FORD MOTOR CO, DEARBORN, MI 48121 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 18卷 / 02期

关键词：

D O I：

10.1116/1.570724

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：203 / 207

页数：5

共 22 条

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