THE GROWTH OF HIGHLY RESISTIVE GALLIUM NITRIDE FILMS

被引:32
作者
LAKSHMI, E
MATHUR, B
BHATTACHARYA, AB
BHARGAVA, VP
机构
[1] INDIAN INST TECHNOL,DEPT ELECT ENGN,NEW DELHI 110029,INDIA
[2] TATA INST FUNDAMENTAL RES,BOMBAY 400005,INDIA
关键词
D O I
10.1016/0040-6090(80)90441-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:77 / 82
页数:6
相关论文
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